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Solutions for vacuum coating consumables in the optoelectronic industry

There are three forms of vacuum coating: evaporation coating, sputtering coating, and ion plating. It is currently the mainstream technology to achieve film growth by means of physical vapor deposition (PVD). UMM produces and supplies various forms of high-quality and high-purity metal evaporation materials and sputtering targets to ensure that users get the best coating quality.

Detailed Description

Solution Advantages

 

1  Evaporation coating is to heat and evaporate a substance in a vacuum to produce metal vapor deposition (condensation) on the solid surface to become a thin film   2  Sputtering coating is to bombard the surface of the deposited target with high-energy particles, so that the particles on the target surface get energy and escape the surface, and then deposit on the substrate to obtain a thin film.   3  Ion plating means that after the molecules of the evaporated substance are ionized by electron impact, they are deposited on the surface of the substrate in the form of ions to form a thin film.

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